The basic function of a test single, multi-layered translucent film thickness, refractive index and absorption coefficient of 2, film uniformity testing and simulation calculation function, etc. Features l powerful data processing operations and materials NK database; l simple, easy The visual test interface, you can set different parameters according to user needs; l fast, accurate and stable parameters of the test; l Supports multi-functional integration and customization accessories; l support different levels of user control mode; l Supports multi-functional simulation, etc. . System Configuration Model: SE200BM-M300 detectors: the detector array source: high power DUV-Vis-NIR light composite measure angles change: software settings automatically adjust the platform: ρ-θ configuration of automated imaging software: TFProbe 3.2 version of the software computer : Inter dual-core processor, 19 "Widescreen LCD Monitor Power: 110-240V AC / 50-60Hz, 6A Warranty: machine and spare parts for one year warranty Specifications Wavelength range: 250nm to 1000 nm wavelength resolution: 1nm spot size: 1mm to 5mm variable incidence angle range: 10-90 ° incidence angle changes Resolution: 0.01 degrees Sample size: maximum diameter of 300mm substrate size: up to 20 mm thick can measure the thickness range *:? 0nm 10μm Measurement time: about 1 sec / location point accuracy *: better than 0.25% repeatability error *: Less than 1 l optional items for reflection or transmission photometric measurements; l used to measure small areas of tiny spots; l for changing the incident? Automatic protractor angle; l X-Y imaging platform (XY mode, replace ρ-θ mode) l heating / cooling platform; l sample mounted vertically goniometer; l DUV wavelength or can be extended to the far IR range; l scanning monochromator Instrument configuration l joint MSP digital imaging capabilities for image samples were mainly used to measure other applications through thin film analysis class field:. l glass coating areas (LowE, solar ...) l Semiconductor Manufacturing (PR, Oxide , Nitride ...) l LCD (ITO, PR, Cell gap ...) l medicine, biology and materials fields of film l ink, mineralogy, pigments, toner, etc. l medicine, intermediate device l optical coating, TiO2 , SiO2, Ta2O5 ... .. l l semiconductor compound on MEMS / MOEMS system functional film l amorphous, nano-crystalline silicon material and